Source-Mask Optimization - Features

At a Glance

  • Stabilize Source: MO Exposure Optics
    • Improved exposure light uniformity and lamp stability
    • Telecentric illumination and uniform angular spectrum of illumination light until the edge of the wafer
  • Optimize Source: Customized Illumination
    • Switch illumination from contact to proximity in less than a minute
    • Shape illumination to reduce diffraction effects at mask pattern
    • Library of Illumination Filter Plates (IFP)
  • Optimize Masks: Optical Proximity Correction
    • Precompensate print errors like corner rounding and line edge shortening on mask using Optical Proximity Correction (OPC)
    • Combine Customized Illumination (IFP) and OPC

 

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