Welcome to the SUSS blog on Source-Mask Optimization for Mask Aligner Lithography.
Mask aligners are a very cost-efficient tool for 1X photolithography providing a moderate resolution since the early beginnings of semiconductor industry more than 50 years ago. Much has been improved regarding user interface and mechanics. However, the optical principle of shadow lithography never changed much.
Time for a change! We have now introduced a new illumination system für SUSS Mask Aligners, the MO Exposure Optics. The new optics is available for all new and old SUSS Mask Aligners. A stabilized source, improved uniformity, telecentric illumination and customized illumination allows to tweak existing lithography processes, improve CD uniformity, improve resolution, increase your process window and yield.
This blog is an open platform to discuss with all users of mask aligner lithography.
Reinhard